Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold
Status PubMed-not-MEDLINE Jazyk angličtina Země Spojené státy americké Médium print-electronic
Typ dokumentu časopisecké články
Grantová podpora
14 HTSM 05
The Dutch Topconsortia Kennis en Innovatie (TKI) program on high-tech systems and materials
DEC-2011/03/B/ST3/02453
Polish National Science Center
DEC-2012/06/M/ST3/00475
Polish National Science Center
REGPOT-CT-2013-316014
EU FP7 EAGLE project co-financed by the Polish Ministry of Science and Higher Education
14-29772S
Czech Science Foundation
17-05167S
Czech Science Foundation
LG15013
the Ministry of Education, Youth and Sports of the Czech Republic
CZ.02.1.01/0.0/0.0/16_013/0001552
the Ministry of Education, Youth and Sports of the Czech Republic
APVV-15-0202
Scientific Grant Agency of the Ministry of Education, Science, Research and Sport of the Slovak Republic and the Slovak Academy of Sciences
APVV-14-0085
Scientific Grant Agency of the Ministry of Education, Science, Research and Sport of the Slovak Republic and the Slovak Academy of Sciences
PubMed
29271755
PubMed Central
PMC5741122
DOI
10.1107/s1600577517017362
PII: S1600577517017362
Knihovny.cz E-zdroje
- Klíčová slova
- EUV optics, FELs, free-electron laser induced damage, thin films,
- Publikační typ
- časopisecké články MeSH
The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.
ASML Netherlands BV PO Box 324 Veldhoven 5500 AH The Netherlands
Carl Zeiss SMT GmbH Rudolf Eber Strasse 2 Oberkochen 73447 Germany
Deutsches Elektronen Synchrotron DESY Notkestrasse 85 Hamburg 22607 Germany
Helmholtz Zentrum Berlin für Materialien und Energie Albert Einstein Strasse 15 Berlin 12489 Germany
Helmholtz Zentrum Geesthacht Max Planck Strasse 1 Geesthacht 21502 Germany
Institute of Physics Polish Academy of Sciences Al Lotników 32 46 PL 02 668 Warsaw Poland
Laser Laboratorium Göttingen eV Hans Adolf Krebs Weg 1 Göttingen 37077 Germany
Physikalisch Technische Bundesanstalt Abbestrasse 2 12 Berlin 10587 Germany
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