Adenine adlayers on Cu(111): XPS and NEXAFS study
Jazyk angličtina Země Spojené státy americké Médium print
Typ dokumentu časopisecké články
PubMed
26547179
DOI
10.1063/1.4935055
Knihovny.cz E-zdroje
- MeSH
- adenin chemie MeSH
- fotoelektronová spektroskopie * MeSH
- měď chemie MeSH
- molekulární struktura MeSH
- povrchové vlastnosti MeSH
- rentgenová absorpční spektroskopie * MeSH
- Publikační typ
- časopisecké články MeSH
- Názvy látek
- adenin MeSH
- měď MeSH
The adsorption of adenine on Cu(111) was studied by photoelectron and near edge x-ray absorption fine structure spectroscopy. Disordered molecular films were deposited by means of physical vapor deposition on the substrate at room temperature. Adenine chemisorbs on the Cu(111) surface with strong rehybridization of the molecular orbitals and the Cu 3d states. Annealing at 150 °C caused the desorption of weakly bonded molecules accompanied by formation of a short-range ordered molecular adlayer. The interface is characterized by the formation of new states in the valence band at 1.5, 7, and 9 eV. The present work complements and refines existing knowledge of adenine interaction with this surface. The coverage is not the main parameter that defines the adenine geometry and adsorption properties on Cu(111). Excess thermal energy can further rearrange the molecular adlayer and, independent of the initial coverage, the flat lying stable molecular adlayer is formed.
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