Ge4+ doped TiO2 for stoichiometric degradation of warfare agents
Jazyk angličtina Země Nizozemsko Médium print-electronic
Typ dokumentu časopisecké články, práce podpořená grantem
PubMed
22640824
DOI
10.1016/j.jhazmat.2012.05.007
PII: S0304-3894(12)00489-X
Knihovny.cz E-zdroje
- MeSH
- chemické bojové látky chemie MeSH
- dekontaminace metody MeSH
- germanium chemie MeSH
- kovové nanočástice chemie MeSH
- organothiofosforové sloučeniny chemie MeSH
- soman chemie MeSH
- titan chemie MeSH
- yperit chemie MeSH
- Publikační typ
- časopisecké články MeSH
- práce podpořená grantem MeSH
- Názvy látek
- chemické bojové látky MeSH
- germanium MeSH
- organothiofosforové sloučeniny MeSH
- soman MeSH
- titan MeSH
- titanium dioxide MeSH Prohlížeč
- VX MeSH Prohlížeč
- yperit MeSH
Germanium doped TiO(2) was prepared by homogeneous hydrolysis of aqueous solutions of GeCl(4) and TiOSO(4) with urea. The synthesized samples were characterized by X-ray diffraction, scanning electron microscopy, EDS analysis, specific surface area (BET) and porosity determination (BJH). Ge(4+) doping increases surface area and content of amorphous phase in prepared samples. These oxides were used in an experimental evaluation of their reactivity with chemical warfare agent, sulphur mustard, soman and agent VX. Ge(4+) doping worsens sulphur mustard degradation and improves soman and agent VX degradation. The best degree of removal (degradation), 100% of soman, 99% of agent VX and 95% of sulphur mustard, is achieved with sample with 2 wt.% of germanium.
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